Wang, Investigation on SiGe Selective Epitaxy for Source and Drain Engineering i…
Wang, Investigation on SiGe Selective Epitaxy for Source and Drain Engineering i
Wang, Guilei: Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond. Singapore, Springer, 2019. XVI, 115 p. Hardcover. Versand aus Deutschland / We dispatch from Germany via Air Mail. Einband bestoßen, daher Mängelexemplar gestempelt, sonst sehr guter Zustand. Imperfect copy due to slightly bumped cover, apart from this in very good condition. Stamped. Springer Theses. Recognizing Outstanding Ph.D. Research.
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